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Characterizations of C10-DNTT film and OTFTs

ZL Zhongzhong Luo
BP Boyu Peng
JZ Junpeng Zeng
ZY Zhihao Yu
YZ Ying Zhao
JX Jun Xie
RL Rongfang Lan
ZM Zhong Ma
LP Lijia Pan
KC Ke Cao
YL Yang Lu
DH Daowei He
HN Hongkai Ning
WM Wanqing Meng
YY Yang Yang
XC Xiaoqing Chen
WL Weisheng Li
JW Jiawei Wang
DP Danfeng Pan
XT Xuecou Tu
WH Wenxing Huo
XH Xian Huang
DS Dongquan Shi
LL Ling Li
ML Ming Liu
YS Yi Shi
XF Xue Feng
PC Paddy K. L. Chan
XW Xinran Wang
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We used ellipsometry mapping, high-resolution AFM and cross-polarized optical microscopy to characterize the monolayer C10-DNTT film. The ellipsometry mapping was performed on a Woollam RC2-XI mapping ellipsometer in the wavelength range of 210–2500 nm. For high-resolution AFM, the experiments were conducted on Asylum Cypher under ambient conditions. The cross-polarized optical reflection micrographs were performed by the ScanPro spectro-microscope under the white light. We used cross-sectional TEM to characterize the interface and thickness of sub-thermionic OTFTs. The TEM specimens were prepared using a FEI Scois Dualbeam focused ion beam. After that, the specimens were characterized using a high-resolution JEOL JEM-2100F TEM with acceleration voltage of 200 kV equipped with energy-dispersive spectroscopy detector.

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