Improve Research Reproducibility A Bio-protocol resource
Concise Method
tooltip

Microfabrication of submicron elastomeric pillar array

TS Tae Hwan Shin
AK Abdurazak Aman Ketebo
DL Da Yeon Lee
SL Seungah Lee
SK Seong Ho Kang
SB Shaherin Basith
BM Balachandran Manavalan
DK Do Hyeon Kwon
SP Sungsu Park
GL Gwang Lee
request Request a Protocol
ask Ask a question
Favorite

Photolithography was used to fabricate a silicon wafer mould with a series of holes [72]. To make the pillars, polydimethylsiloxane (PDMS) was mixed in a 10:1 ratio with its curing agent (Sylgard 184; Dow Corning, Midland, MI, USA) and vacuumed for 15 min; the mould was then spin-coated with PDMS at 1,000 RPM for 1 min and again vacuumed for 30 min to remove bubbles. The mould with PDMS was cured at 80 °C for 3 h. The pillar array was manufactured using this method. Each pillar was 900 nm in diameter (D), 1 µm in height (L), and 1.8 µm in centre-to-centre distance. To calculate the bending stiffness (k) of the pillar, the Euler–Bernoulli beam theory was applied [31]:

where E is the Young’s modulus (2 MPa) of the cured PDMS. Using this equation, the k of the pillar was calculated to be 24.2 nN/µm.

Copyright and License information: The Author(s) ©2021
Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/. The Creative Commons Public Domain Dedication waiver (http://creativecommons.org/publicdomain/zero/1.0/) applies to the data made available in this article, unless otherwise stated in a credit line to the data.

Do you have any questions about this protocol?

Post your question to gather feedback from the community. We will also invite the authors of this article to respond.

post Post a Question
0 Q&A