B-γ-CsSnI3 film deposition

AW Anjana Wijesekara
SV Silvia Varagnolo
GD G. Dinesha M. R. Dabera
KM Kenneth P. Marshall
HP H. Jessica Pereira
RH Ross A. Hatton
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In a dry nitrogen-filled glovebox CsI, SnI2 and tin(II) halide were mixed together in 1:1:0.1 molar ratio. To this mixture N,N-dimethylformamide (DMF) was added to make an 8 wt% solution (total mass of solids), which was stirred overnight before use. To deposit films, two drops of solution were cast onto the substrate (sufficient to cover the whole substrate), followed by spinning at 4,000 r.p.m. for 60 s. The B-γ-CsSnI3 phase forms immediately upon solvent evaporation.

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