Monolayered graphene was synthesized on copper (Cu)-evaporated 6″ Si wafer by CVD using hydrogen and methane. The sample was spin-coated with poly(methyl methacrylate) (PMMA) and then soft-baked to improve the adhesion of PMMA to graphene. Then, the Cu film was peeled off from the Si wafer and completely etched away in a Cu etchant. Finally, the separated graphene layer was transferred onto a 6″ Si wafer covered with a thermally grown SiO2 film (300 nm in thickness).
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