Electrodeposition of porous membranes
This protocol is extracted from research article:
Electrodeposited surfaces with reversibly switching interfacial properties
Sci Adv, Nov 1, 2019; DOI: 10.1126/sciadv.aax0380

For simplicity, the silver porous membrane was electrodeposited using a two-electrode setup. The anode was a carbon rod with a diameter of ~3 mm. The cathode was a piece of gold-coated silicon wafer or copper mesh (with an average pore diameter of about 115 μm) with an area of ~1 cm by 1 cm. The deposition voltage was 1.5 V, unless otherwise specified. The silver porous membrane was electrodeposited for 10 min, unless otherwise specified. The electrolyte was composed of 30 mM silver nitrate and 7 mM SDS. Two volts was used to change the silver porous membrane from superhydrophobic to superhydrophilic. For comparison, pure silver nanoparticle films were electrodeposited at 1.5 V for 10 min in silver nitrate aqueous solution at a concentration of 30 mM. The deposition was performed at room temperature (~25°C). The deposition voltage for lead/lead oxide was 5 V for 10 min. The electrolyte was composed of 15 mM lead acetate trihydrate and 7 mM SDS. Electrodeposition of copper was performed at 3 V for 20 min in an electrolyte solution composed of 15 mM copper nitrate trihydrate and 7 mM SDS.

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