The fabrication began with dissolution of SBS (Sigma-Aldrich, MO, USA) in toluene with sonication. The SBS solution (4 g/40 ml) was then cast on a silicon wafer pretreated with mold release spray (Ease Release 200, Mann Release Technologies Inc., PA, USA) for 5 min and then annealed at 60°C (~3 hours) and then at 95°C (overnight). A bilayer of Ti/SiO2 (5 nm/20 nm) deposited by sputtering (AJA International) rendered the surface of the SBS film hydrophilic.

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