Planar gold substrates were prepared by the template-stripping method reported in the literature, which provided atomically smooth gold layers (28). Briefly, 100-nm-thick Au was evaporated onto a silicon wafer at a growth rate of 0.1 nm/s using an e-beam evaporator. After this, small pieces (ca. 1 cm2) of the bare Si wafer were glued on with epoxy and peeled off together with the Au film. Last, colloidal solutions of the PANI-coated Au NPs were drop-casted on the top of these Au substrates. Before use, this sample was immersed in deionized water overnight to eliminate excess surfactants, followed by treating with HCl (0.2 M) for 2 hours to protonate the PANI layer (17).

Note: The content above has been extracted from a research article, so it may not display correctly.



Q&A
Please log in to submit your questions online.
Your question will be posted on the Bio-101 website. We will send your questions to the authors of this protocol and Bio-protocol community members who are experienced with this method. you will be informed using the email address associated with your Bio-protocol account.



We use cookies on this site to enhance your user experience. By using our website, you are agreeing to allow the storage of cookies on your computer.