3D laser lithography was performed using a commercial direct laser writing system (Photonic Professional GT, Nanoscribe GmbH). This instrument includes an automated interface finder. For writing, we used a long-distance oil-immersion objective (Carl Zeiss LD LCI Plan-Apochromat 63×/1.2 Imm Korr DIC M27) with a correction ring for the refractive index of the immersion medium. Adjustment of the correction ring was performed by minimizing the writing threshold power for the nonfluorescent photoresist. To write the 3D cross-grid support structure, we typically used a constant writing laser power of P = 34.5 mW and a writing velocity of v = 1.5 cm/s. To write the fluorescent photoresists, we used a speed of 1 cm/s and a writing power of 42.5 mW for the deepest layer of fluorescent markers inside the structure and linearly decreased the writing power to 35 mW to write the uppermost layer of markers.

Note: The content above has been extracted from a research article, so it may not display correctly.



Q&A
Please log in to submit your questions online.
Your question will be posted on the Bio-101 website. We will send your questions to the authors of this protocol and Bio-protocol community members who are experienced with this method. you will be informed using the email address associated with your Bio-protocol account.



We use cookies on this site to enhance your user experience. By using our website, you are agreeing to allow the storage of cookies on your computer.