3D laser lithography was performed using a commercial direct laser writing system (Photonic Professional GT, Nanoscribe GmbH). This instrument includes an automated interface finder. For writing, we used a long-distance oil-immersion objective (Carl Zeiss LD LCI Plan-Apochromat 63×/1.2 Imm Korr DIC M27) with a correction ring for the refractive index of the immersion medium. Adjustment of the correction ring was performed by minimizing the writing threshold power for the nonfluorescent photoresist. To write the 3D cross-grid support structure, we typically used a constant writing laser power of P = 34.5 mW and a writing velocity of v = 1.5 cm/s. To write the fluorescent photoresists, we used a speed of 1 cm/s and a writing power of 42.5 mW for the deepest layer of fluorescent markers inside the structure and linearly decreased the writing power to 35 mW to write the uppermost layer of markers.

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