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The sample consisted of nickel nanostructures patterned with electron beam liftoff lithography on a silicon substrate. The tapered nanoantenna was characterized with optical microscopy, scanning electron microscopy (SEM), and atomic force microscopy (AFM), as displayed in fig. S1. The recovered reflectivity values of 0.024 ± 0.017 for the silicon substrate and of 0.16 ± 0.04 for the nickel feature are in agreement with tabulated values (12). The CDI phase image is in agreement with a height of 20 ± 2 nm estimated with AFM. We imaged an additional circular nanostructure to the right of the tapered nanoantenna. Its effect on the dynamic signal has been excluded by the histogram image segmentation.

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