Tetrachloroauric(III) acid (HAuCl4·4H2O, >99.9% metal basis), TOABr (≥98.0%), phenylethanethiol (99%, Sigma-Aldrich), benzyl mercaptane (99%, Sigma-Aldrich), 4-tert-butylbenzylmercaptan (99%, Sigma-Aldrich), p-methylphenylthiophenol (99%, Sigma-Aldrich), 2,4-dimethylbenzenethiol (99%, Sigma-Aldrich), and sodium borohydride (NaBH4, 99.8%, Shanghai Chemical Reagent Co. Ltd.) were used. Ethanol, toluene, acetonitrile, n-pentane, CH2Cl2, and methanol were purchased from Sinopharm Chemical Reagent Co. Ltd. The water used in all experiments was ultrapure (resistivity, 18.2 megohms·cm), produced by a Milli-Q NANO pure water system. All chemicals were used as received.

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