SiO2 sacrificial templates were removed with HF solution to achieve HCS. Typically, C/SiO2 nanoparticles were immersed in 10 wt % HF solution for different periods of time (see the Supplementary Materials), followed by centrifugation and ethanol washing three times. The SiO2 templates can be completely removed after 12 hours of etching. The final HCS were obtained after drying in a vacuum oven.

Note: The content above has been extracted from a research article, so it may not display correctly.



Q&A
Please log in to submit your questions online.
Your question will be posted on the Bio-101 website. We will send your questions to the authors of this protocol and Bio-protocol community members who are experienced with this method. you will be informed using the email address associated with your Bio-protocol account.



We use cookies on this site to enhance your user experience. By using our website, you are agreeing to allow the storage of cookies on your computer.